Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors |
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| Affiliation: | 1. Department of Micro- and Nanosystem Technology, University College of Southeast Norway, Campus Vestfold, Raveien 215, 3184 Borre, Norway;2. Micromechanical Systems Group, IMN MacroNano®, Technische Universität Ilmenau, PF 100565, D-98694 Ilmenau, Germany;3. VTT Technical Research Centre of Finland, P. O. Box 1000, FI-02044 VTT, Espoo, Finland;1. National Institute for Research and Development in Microtechnologies (IMT-Bucharest), 126A Erou Iancu Nicolae Street, Voluntari 077190, Romania;2. Faculty of Physics, University of Bucharest, 405 Atomistilor Street, Magurele 077125, Romania;3. Extreme Light Infrastructure-Nuclear Physics (ELI-NP), “Horia Hulubei” National R&D Institute for Physics and Nuclear Engineering (IFIN-HH), Magurele, Ilfov 077125, Romania;4. Laboratory of Chemical Technology and Catalysis, Department of Organic Chemistry, Biochemistry and Catalysis, Faculty of Chemistry, University of Bucharest, 4–12, Bulevardul Regina Elisabeta, Bucharest 030018, Romania |
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| Abstract: | We demonstrate high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor. By unique atomic layer deposition (ALD) technology, a conformal nanolayer of TiN was deposited on the silicon nanorod arrays as the active material. The TiN coated silicon nanorods as a supercapacitor electrode lead to a 6 times improvement in capacitance compared to flat TiN film electrode. |
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