Temperature variation of the mobility gap in non-polar amorphous semiconductors

For a non-polar amorphous semiconductor such as a-Si, we derive an explixit formula for (?E_g/?T)_V, the derivative with temperature of the mobility gap E_g at constant volume V. Within the framework of second-order perturbation theory for the electron-phonon (eφ) interaction, many of our physical assumptions are fundamentally different from those that apply to the crystal phase. The principal ingredients of our model are: (1) the random-phase-model (RPM); (2) the principle of non-conservation of particle momentum in the eφ interaction; and (3) the deformation potential approximation. Narrowing of E_g is found with increasing values of the temperature T. At very low T, we have $\text{(?E}{}_{\mathrm{<mtext>g</mtext>}}\text{/?T)}{}_{\mathrm{<mtext>V</mtext>}}\text{≌ ? ¢A · c}{}_{\mathrm{V}}\text{(T)}$, where c_V(T) is the average lattice specific heat per mode at constant volume and ¢A is a positive dimensionless quantity in the model. By contrast with low-temperature behavior of the crystal, this result implies that the mobility gap at constant volume dynamically responds to the phonomic “gas” of the disordered lattice. The high-T limit yields behavior quite similar to that of the crystal phase. We find $\text{(?E}{}_{\mathrm{<mtext>g</mtext>}}\text{/?T)}{}_{\mathrm{V}}\text{≌ ? x ¢A · k}{}_{\mathrm{<mtext>B</mtext>}}$, where k_B is Boltzmann's constant and the parameter x, expected to be confined to the interval $\text{1}\text{2}\text{? x ? 1}$, measures the admixture of the optical-phonon and acoustical-phonon coupling strengths.