Photoelastic determination of stresses in multiple-pin connectors |
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Authors: | MW Hyer DH Liu |
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Institution: | (1) Department of Engineering Science and Mechanics, Virginia Polytechnic Institute and State University, 24061 Blacksburg, VA |
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Abstract: | The design, fabrication, and testing of photoelastic models of double-lap, multiple-pin connectors are discussed. Interest
is in the stresses in the inner laps. These stresses are determined by constructing models with photoelastic inner laps and
transparent-acrylic outer laps. The connectors have two pins, in tandem, parallel to the load direction. A photoelastic-isotropic
point is shown to permit the evaluation of load sharing between the two pins. A numerical scheme, utilizing the isochromatic-
and isoclinic-photoelastic data and a finite-difference representation of the planestress equilibrium equations, is used to
compute the stresses around the two pins. Representative stress distributions and stress-concentration factors are shown. |
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Keywords: | |
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