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Photoelastic determination of stresses in multiple-pin connectors
Authors:MW Hyer  DH Liu
Institution:(1) Department of Engineering Science and Mechanics, Virginia Polytechnic Institute and State University, 24061 Blacksburg, VA
Abstract:The design, fabrication, and testing of photoelastic models of double-lap, multiple-pin connectors are discussed. Interest is in the stresses in the inner laps. These stresses are determined by constructing models with photoelastic inner laps and transparent-acrylic outer laps. The connectors have two pins, in tandem, parallel to the load direction. A photoelastic-isotropic point is shown to permit the evaluation of load sharing between the two pins. A numerical scheme, utilizing the isochromatic- and isoclinic-photoelastic data and a finite-difference representation of the planestress equilibrium equations, is used to compute the stresses around the two pins. Representative stress distributions and stress-concentration factors are shown.
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