Effect of local curvature of internal and external interfaces on mass transfer responsible for thin film degradation

The degradation of thin films on thermal annealing was studied by atomic force and scanning electron microscopy. Main factors that govern high-temperature mass transfer in the multilayer structures were disclosed. It is shown that local curvature of internal and external interfaces is a driving force in the mass transfer responsible for thin film degradation, redistribution of alloying elements, and formation of silicides.