Optical limiting in pulsed laser deposited VO2 nanostructures |
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Authors: | M Maaza D Hamidi A Simo T Kerdja AK Chaudhary JB Kana Kana |
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Institution: | 1. Department of Physics and Astronomy, University of Nigeria Nsukka, Nigeria;2. National Centre for Physics, Quaid-i-Azam University campus, Islamabad 44000, Pakistan;3. Center for Micro and Nano Devices, Department of Physics, COMSATS University Islamabad, Pakistan;4. NPU-NCP Joint International Research Center on Advanced Nanomaterials and Defects Engineering, Northwestern Polytechnical University, Xi''an 710072, China;5. School of Materials Science & Engineering, Northwestern Polytechnical University, Xi''an 710072, China;6. Nanosciences African Network (NANOAFNET), iThemba LABS-National Research, South Africa;7. Microscopy Unit, University of Western Cape, South Africa;8. UNESCO-UNISA Africa Chair in Nanosciences/Nanotechnology, College of Graduate Studies, University of South Africa (UNISA), Muckleneuk Ridge, P.O. Box 392, Pretoria, South Africa;9. Department of Physics, Faculty of Natural and Applied Sciences, Coal City University, Enugu, Nigeria |
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Abstract: | Being a Mott type oxide, at a temperature of ~ 68 °C and ambient pressure, stoichiometric VO2 undergoes a first order metal-insulator transition, which is accompanied by a reversible abrupt change in the band gap opening. From an optical point of view, this metal-insulator transition manifests itself by a significant and reversible variation of the refractive index under either a thermal stimuli or by photo-induction. This contribution reports on the ultrafast optical limiting in the IR regime of pulse laser deposited VO2 nanostructures. |
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