强流脉冲电子束作用下钽金属靶膨胀的轴向约束

研究了强流脉冲电子束与钽金属靶相互作用后靶材流体动力学膨胀的轴向约束问题。由于电子束在金属钛和钽内的能量沉积存在差异，未完全气化的钛箔对气化膨胀的钽材能够起到约束作用，并且可以通过吸收钽的能量来降低钽的膨胀速度。通过分析比较电子束在靶上形成孔洞的形貌以及高速相机拍摄得到的不同时刻靶材喷射的图像，证实了钛箔能够对钽金属靶的轴向膨胀起到一定的约束作用。尤其是电子束打靶过后1 μs内的初始阶段，约束效果比较明显。

Restriction of tantalum target expansion along axis bombarded by high-current pulsed electron beam

The restriction of tantalum target expansion along axis bombarded by high-current pulsed electron beams was studied. The vaporized tantalum target can be blocked by the titanium foil partially vaporized due to the difference of energy deposition in both materials by the electron beam, and furthermore, the energy in tantalum can be absorbed by titanium to lower the expansion speed. By comparison of the holes in the targets formed by the electron beam and the target expansion pictures captured by high speed camera, the restriction of the titanium foil to the tantalum target has been confirmed, and such effect is distinct within 1 μs after the electron beam reaching the target.