| 磁控溅射制备ZnO薄膜的受激发射特性的研究 |
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| 引用本文： | 王晶,张希清,腾小瑛,熊德平,林鹏,王丽,黄世华. 磁控溅射制备ZnO薄膜的受激发射特性的研究[J]. 光谱学与光谱分析, 2004, 24(7): 775-778 |
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| 作者姓名： | 王晶 张希清 腾小瑛 熊德平 林鹏 王丽 黄世华 |
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| 作者单位： | 北京交通大学光电子技术研究所,信息存储、显示与材料开放实验室,北京,100044 |
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| 基金项目： | 国家自然科学基金 (6960 60 0 1 )，高等学校骨干教师资助计划 (2 0 0 0 668)，教育部留学回国人员科研启动基金 (Lico30 0 4 )资助 |
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| 摘 要： | 用射频磁控反应溅射法在二氧化硅衬底上制备ZnO薄膜。得到了在不同温度下ZnO薄膜的吸收与光致发光。观测到了纵光学波 (LO)声子吸收峰与自由激子吸收峰 ;室温 (30 0K)下 ,PL谱中仅有自由激子发光峰。这些结果证实了ZnO薄膜具有较高的质量。探讨了变温ZnO薄膜的发光特性。研究了ZnO薄膜的受激发射特性。
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| 关 键 词： | ZnO薄膜 受激发射 激子 磁控溅射 |
| 文章编号： | 1000-0593(2004)07-0775-04 |
| 修稿时间： | 2002-09-23 |
Stimulated Emission Characteristics of ZnO thin Films Deposited by Magnetron Sputtering on SiO2 Substrates |
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| WANG Jing,ZHANG Xi-qing,TENG Xiao-ying,XIONG De-ping,LIN Peng,WANG Li,HUANG Shi-huaKey Laboratory of Information Storage and Display. Stimulated Emission Characteristics of ZnO thin Films Deposited by Magnetron Sputtering on SiO2 Substrates[J]. Spectroscopy and Spectral Analysis, 2004, 24(7): 775-778 |
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| Authors: | WANG Jing ZHANG Xi-qing TENG Xiao-ying XIONG De-ping LIN Peng WANG Li HUANG Shi-huaKey Laboratory of Information Storage Display |
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| Affiliation: | Key Laboratory of Information Storage and Display, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, China. |
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| Abstract: | ZnO thin films were deposited by magnetron sputtering on SiO 2 substrates. The temperature dependence of the absorption spectra and the photoluminescence spectra was studied for ZnO thin film. The absorption of the longitudinal optical (LO) phonons and the free-excitons was observed at room temperature. The free-exciton emission was only observed in PL spectra at room temperature, the results indicate that ZnO thin films have excellent quality and low density of defects. The stimulated emission properties of ZnO thin films were investigated. When excitation intensity is above threshold, the FWHM of stimulated emission peak increases and the stimulated emission peak shows red shift with increasing excitation intensity. Our analysis shows that the optical gain is due to electron-hole plasma emission. |
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| Keywords: | ZnO thin film Stimulated emission Exciton Magnetron sputtering |
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