A spectral interferometric method to measure thickness with large range |
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Authors: | Qing Xiao Qingming Luo |
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Affiliation: | Britton Chance Center for Biomedical Photonics, Wuhan National Laboratory for Optoelectronics-Huazhong University of Science and Technology, Wuhan 430074, PR China |
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Abstract: | We present a spectral interferometric method to measure the thickness of an optical plate or a film with a single layer. The system is based on the Michelson interferometer configuration, and the spectral interference signal of a broadband light source is recorded by a spectrometer. The optical path difference (OPD) between two interfering beams can be obtained by Fourier transform from the spectral interferogram. Gaussian fitting is used to find the exact peak of fringe to enhance the precision of the measurements. When the sample is inserted into the sample beam, the film’s thickness can be calculated by comparing the change of OPD, provided that the sample group refractive index is known. Only a single measurement is needed to determine a film’s thickness after the initial OPD of the system is calibrated. As no moving parts are required, the system has good stability. In particular, a large range of thicknesses, from micrometers up to several millimeters, can be measured. Such a large range is valuable for optical measurements. For demonstration, we measured the thicknesses of preservative film, cover glass and carrier glass, which were 9.6 ± 0.55, 156.1 ± 0.75, 1008.44 ± 0.96 μm, respectively. |
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Keywords: | Spectral interferometry Thickness measurement Large range Optical path difference |
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