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Towards wafer-scale integration of high repetition rate passively mode-locked surface-emitting semiconductor lasers
Authors:D.?Lorenser,H.J.?Unold  author-information"  >  author-information__contact u-icon-before"  >  mailto:unold@phys.ethz.ch"   title="  unold@phys.ethz.ch"   itemprop="  email"   data-track="  click"   data-track-action="  Email author"   data-track-label="  "  >Email author,D.J.H.C.?Maas,A.?Aschwanden,R.?Grange,R.?Paschotta,D.?Ebling,E.?Gini,U.?Keller
Affiliation:(1) Institute of Quantum Electronics, Physics Department, Swiss Federal Institute of Technology (ETH), ETH Zürich Hönggerberg, Wolfgang-Pauli-Str. 16, 8093 Zürich, Switzerland;(2) FIRST Center for Micro- and Nanoscience, Swiss Federal Institute of Technology (ETH), ETH Zürich Hönggerberg, Wolfgang-Pauli-Str. 10, 8093 Zürich, Switzerland
Abstract:One of the most application-relevant milestones that remain to be achieved in the field of passively mode-locked surface-emitting semiconductor lasers is the integration of the semiconductor absorber into the gain structure, enabling the realization of ultra-compact high-repetition-rate laser devices suitable for wafer-scale integration. We have recently succeeded in fabricating the key element in this concept, a quantum-dot-based saturable absorber with a very low saturation fluence, which for the first time allows stable mode locking of surface-emitting semiconductor lasers with the same mode areas on gain and absorber. Experimental results at high repetition rates of up to 30 GHz are shown. PACS 42.55.Px; 42.60.Fc; 42.82.Gw
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