| 原子光刻技术 |
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| 引用本文： | 刘敏.原子光刻技术[J].科技信息,2009(15):81-82. |
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| 作者姓名： | 刘敏 |
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| 作者单位： | 唐山学院基础教学部; |
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| 摘 要： | 针对原子光刻技术在纳米计量及传递作用中的特殊地位,介绍了该技术的基本原理、方案、刻及Cr原子光刻实验.通过与其他微刻印方法的比较,展望了其应用于微电子学等领域的前景。
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| 关 键 词： | 纳米计量 纳米传递 原子光刻 沉积条纹 |
Atom Lithograpy |
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| LIU Min.Atom Lithograpy[J].Science,2009(15):81-82. |
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| Authors: | LIU Min |
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| Institution: | Tangshan College;Department of Foundational Teaching;Tangshan Hebei 063000 |
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| Abstract: | Based on atom lithography's role in nanometrology and transfer standard,the working principles,the overall schemes,the individual techniques and the acquired results are described.This new method has been compared with the existing micro-lithographic techniques,and the application potentialities in the micro-electronics and other fields havebeen discussed. |
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| Keywords: | Nanometrology Transfer standard Atom lithograpy Atom deposition Deposition pattern |
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