Photoelectrochromic properties of NiO film deposited on an N-doped TiO2 photocatalytical layer |
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Authors: | H. Huang S.X. Lu W.K. Zhang Y.P. Gan C.T. Wang L. Yu X.Y. Tao |
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Affiliation: | College of Chemical Engineering and Materials Science, Zhejiang University of Technology, Hangzhou 310032, China |
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Abstract: | N-doped TiO2 film was synthesized on indium–tin oxide (ITO) conducting glass substrate by the hydrolysis method and characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). Then high porous NiO was deposited onto the TiO2?xNx layer by chemical bath deposition (CBD) to prepare a double-layer TiO2?xNx/NiO electrode. The photoelectrochromic properties of the TiO2?xNx/NiO electrode were discussed through the results of UV–vis transmittance spectra, cyclic voltammogram and photocurrent transient measurements. It was found that the TiO2?xNx/NiO electrode was sensitive to light and exhibited a noticeable photoelectrochromism. The NiO film changed its color from colorless to brown, and the transmittance varied from 86.8% to 14.5% at 500 nm after 1 h irradiation. |
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