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Improving organic transistor performance through contact-area-limited doping
Authors:Jun Li  Xiao-Wen Zhang  Liang Zhang  Xue-Yin Jiang  Wen-Qing Zhu  Zhi-Lin Zhang
Institution:1. Department of Materials Science, Shanghai University, Jiading, Shanghai 201800, People’s Republic of China;2. Key Laboratory of Advanced Display and System Applications, Ministry of Education, Shanghai University, Shanghai 200072, People’s Republic of China;1. Department of Chemical Engineering, Soongsil University, Seoul 156-743, Republic of Korea;2. School of Chemical Engineering, Sungkyunkwan University, Suwon 440-746, Republic of Korea;3. SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon 440-746, Republic of Korea;4. Center for Human Interface Nano Technology (HINT), Sungkyunkwan University, Suwon 440-746, Republic of Korea;1. Univ. Lille, CNRS, Centrale Lille, Yncréa ISEN, Univ. Polytechnique Hauts-de-France, UMR 8520 - IEMN, F-59000 Lille, France;2. Laboratoire physique des matériaux, Faculté des Sciences de Bizerte, Université de Carthage, 7021 Jarzouna, Bizerte, Tunisia;1. Technical Physics Division, Bhabha Atomic Research Centre, Mumbai 400085, India;2. Chemistry Division, Bhabha Atomic Research Centre, Mumbai 400085, India;1. School of Electronics and Electrical Engineering, SKKU Advanced Institute of Nanotechnology (SAINT), SKKU-Samsung Graphene Center, Sungkyunkwan University, Suwon 440-746, Republic of Korea;2. School of Advanced Materials Science and Engineering, SKKU Advanced Institute of Nanotechnology (SAINT), Center for Human Interface Nanotechnology (HINT), SKKU-Samsung Graphene Center, Sungkyunkwan University, Suwon 440-746, Republic of Korea;3. Department of Electrical Engineering, Stanford University, Stanford, CA 94305, USA;4. School of Electrical Engineering, Korea University, Seoul 136-701, Republic of Korea
Abstract:
Keywords:
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