Effect of hydroxyl impurity on temperature coefficient of refractive index of synthetic silica glasses

We have studied the temperature coefficient of the refractive index of synthetic silica glasses with various hydroxyl impurities. The refractive index was measured at 15 °C and 35 °C at 1.707–0.238 μm wavelengths. The temperature coefficient of a low-OH group (110 wt. ppm) containing glass increased from 8.0 ± 0.2 × 10^?6/°C (at 1.707 μm) to 14.0 ± 0.2 × 10^?6/°C (at 0.238 μm), although it increased respectively from 7.0 ± 0.2/°C to 12.0 ± 0.2 × 10^?6/°C for a high-OH group (1300 wt. ppm) containing glass. The three-term Sellmeier equation, having two terms with resonance photon energies in the vacuum ultraviolet region and one term in the infrared region, was used to analyze the wavelength dispersion of the refractive index. Increasing temperatures shifted the resonance energy in the second term by ?4.14 ± 0.4 × 10^?4 eV/°C for low-OH (110 wt. ppm) glass and ?2.64 ± 0.4 × 10^?4 eV/°C for high-OH (1300 wt. ppm) glass. The fundamental absorption edge in the vacuum ultraviolet region shifted by ?8.8 ± 0.7 × 10^?4 eV/°C for the low-OH glass and ?6.3 ± 0.7 × 10^?4 eV/°C for the high-OH glass in a region of 25–100 °C. Both high-OH glass shift rates were lower than low-OH glass shift rates. The lower temperature coefficient for the Si–OH-related band probably explains the smaller temperature coefficient for high-OH glass: the absorption band of Si–O–H structure is located at lower energy side close to the fundamental absorption band associated with the Si–O–Si structure.