| Na或Cu掺杂对Si/NiO异质结的光电性能影响 |
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| 引用本文： | 李彤,王铁钢,范其香,刘真真,王雅欣,赵新为.Na或Cu掺杂对Si/NiO异质结的光电性能影响[J].发光学报,2018,39(6):784-789. |
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| 作者姓名： | 李彤 王铁钢 范其香 刘真真 王雅欣 赵新为 |
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| 作者单位： | 1. 天津职业技术师范大学 电子工程学院, 天津 300222;
2. 天津职业技术师范大学 机械工程学院, 天津 300222;
3. 东京理科大学 物理系, 日本 |
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| 基金项目： | 国家自然科学基金（51301181，51501130）；天津市高等学校创新团队培养计划（TD12-5043）；天津市应用基础与前沿技术研究计划重点项目（15JCZDJC39700）；天津职业技术师范大学人才计划资助项目（RC14-53，RC14-54）；天津市科技特派员项目（16JCTPJC49500）；天津市科委科技发展战略项目（15JCYBJC52200）资助 |
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| 摘 要： | 利用磁控溅射方法制备了引入Na或Cu元素前后Si/NiO异质结。实验结果表明，Na元素引入后的Si/NiO：Na异质结的整流特性最佳。此时，Si/NiO：Na异质结光学透过率可以达到70%，这可能是由于Si/NiO：Na异质结的结晶质量较优、薄膜内缺陷少所致。Si/NiO：Na异质结I-V曲线的拟合结果显示界面态状态也会影响其整流特性。而Si/NiO和Si/NiO：Cu异质结都没能获得较好的整流特性，可能是薄膜内缺陷增多所致。这一结论得到了XRD、SEM、AFM和UV结果的支持。
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| 关 键 词： | NiO Na掺杂 Cu掺杂 异质结 整流特性 |
| 收稿时间： | 2017-09-27 |
Optical and Electrical Properties of Si/NiO Heterojunctions with and Without Na or Cu Doping |
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| LI Tong,WANG Tie-gang,FAN Qi-xiang,LIU Zhen-zhen,WANG Ya-xin,ZHAO Xin-wei.Optical and Electrical Properties of Si/NiO Heterojunctions with and Without Na or Cu Doping[J].Chinese Journal of Luminescence,2018,39(6):784-789. |
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| Authors: | LI Tong WANG Tie-gang FAN Qi-xiang LIU Zhen-zhen WANG Ya-xin ZHAO Xin-wei |
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| Institution: | 1. College of Electronic Engineering, Tianjin University of Technology and Education, Tianjin 300222, China;
2. College of Mechanical Engineering, Tianjin University of Technology and Education, Tianjin 300222, China;
3. Department of Physics, Tokyo University of Science, Japan |
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| Abstract: | The Si/NiO heterojunctions with and without Na or Cu doping were prepared by the magnetron sputtering method. The best rectifying characteristics appears in the Si/NiO:Na heterojunction, where the average optical transmittance can reach to 70% in the visible range, which may be explained by the reduced defects due to the improved crystallization. The fitted I-V curve of Si/NiO:Na heterojunction indicates that the interface state also affects the rectifying property. Good rectifying property hasn't been observed in Si/NiO and Si/NiO:Cu heterojunctions because of the appearance of more defects. These results are also evidenced by XRD, SEM, AFM and UV results. |
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| Keywords: | NiO Na doping Cu doping heterojunctions rectifying property |
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