Production of nanostructured magnetic materials using holographic lithography |
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| Affiliation: | 1. Cidade Universitária Zeferino Vaz, Universidade Estadual de Campinas, CP 6165, CEP 13083-970 Campinas, SP, Brazil;2. Laboratório Nacional de Luz Síncrotron, CP 6192, CEP 13084-971 Campinas, SP, Brazil;1. STMicroelectronics, 850 rue Jean Monnet, 38920 Crolles, France;2. Université Grenoble Alpes, CNRS, Grenoble INP, TIMA, F-38000 Grenoble, France;3. Institut Quantique, Université de Sherbrooke, 2500 Boulevard de l’Université, Sherbrooke, QC J1K 2R1, Canada;4. Nanoacademic Technologies Inc., Suite 802, 666 rue Sherbrooke Ouest, Montréal, QC H3A 1E7, Canada;1. Department of Electronics and Communication Engineering, J. N. Government Engineering College, Sundernagar, Mandi, India;2. Department of Electrical and Electronics Engineering, University of Petroleum and Energy Studies, Dehradun, India;3. Discipiline of Electrical, Electronic and Computer Engineering, University of KwaZulu-Natal, Durban-4041, South Africa;1. Department of Materials Science and Metallurgical Engineering, Indian Institute of Technology Hyderabad, Kandi 502285, Telangana, India;2. Department of Physics, Indian Institute of Technology Hyderabad, Kandi 502285, Telangana, India;1. Department of Electrical Engineering, Sirjan University of Technology, Sirjan, Iran;2. School of Engineering, RMIT University, Melbourne, Australia |
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| Abstract: | The magnetic properties of Co, Ni and NiFe sub-micrometric structures produced by holographic lithography and sputtering techniques are investigated. The structures were obtained using a mask previously recorded by holography in a photo-resist film coated on a quartz substrates. After this procedure, the magnetic material was deposited using the sputtering technique, and the photo resist was removed by lift-off. Samples with thicknesses of around 500 Å were grown in stripes structures and periodicity of 800 nm. The results indicate that the samples with Co and NiFe present exchange bias effect and this is due the surface oxidation. |
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