Mechanism of plasma polymerization ofN-silyl-substituted cyclodisilazane: Structure and properties of polymer film

NN-Bis(dimethylsilyl)tetramethylcyclodisilazane (NSCDSN) was selected for plasma polymerization as a model monomer representing N-silyl-substituted cyclodisilazanes. Owing to the aromatic character resulting from the strong (d-p) coupling between silicon and nitrogen atoms, these compounds manifest the highest thermal stability among the organosilicones. GC/MS examination of a low-molecular-weight fraction evaporated from the plasma polymer revealed the presence of various monomer derivatives having mostly the general structure of N-silyl-substituted cyclodisilazane (Si₄N₂) units. GC/MS and ATR/IR studies have shown that the Si₄N₂ skeleton displays a high resistance to plasma fragmentation and that it was incorporated as such into the polymer film. A radical mechanism for plasma polymerization was postulated assuming the formation of and propagation precursors. The low value found for the polar component of the surface free energy confirmed the contribution of Si₄N₂ units to the polymer film. TGA investigation showed the rate and degree of thermal decomposition of plasma-polymerized (PP) NSCDSN to be lower than those of plasma polymers from N-hydrogen-substituted silazanes. Vacuum pyrolysis, at 800°C, converted the polymer film into a glassy, dense, and almost inorganic material with a strong adhesion to the metal substrates.