碳化硼薄膜的激光法制备及性能

采用KrF准分子激光器，在Si，Ge光学衬底上制备了碳化硼薄膜，研究了不同激光能量、靶材与衬底距离、衬底负偏压等条件对薄膜性能的影响。利用傅里叶变换红外光谱仪（FT-IR）和纳米压痕仪，并依据光学薄膜测试的通用标准，对样品的光学透过率、纳米硬度及膜层与衬底的结合性能进行了测试。结果表明:Si，Ge衬底单面镀碳化硼薄膜后最高透过率提高10%以上，纳米硬度提高到未镀膜的3倍以上，且膜层与衬底有较好的结合性能，表明制备的碳化硼薄膜可对光学材料起到较好的增透保护作用。

Preparation and properties of boron carbide film using pulsed laser deposition

Boron carbide films were deposited on Si and Ge substrates using KrF eximer laser. Influences of laser energy, distance between the target and substrate, and bias voltage were studied. A Fourier transform infrared spectroscope and a nano-indenter were used to test the optical transmission and hardness of the samples. Furthermore, the adhesion performance of the film and substrate was tested according to the common criterion of optical films. The largest transmission of Si and Ge advanced 10% after only one surface of substrates was coated by boron carbide films. The nano-hardness of the coated substrates reached more than 3 times that of the uncoated substrates and the adhesion was also satisfactory. The results show that boron carbide films are useful as anti-reflective and protective films for optical substrates.