The influence of monovalent cations on the stability of electrochemically formed nickel fluoride films |
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| Authors: | M. Noel R. Santhanam S. Chidambaram |
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| Affiliation: | (1) Central Electrochemical Research Institute, Karaikudi 630 006, India e-mail: cecrik@cscecri.ren.nic.in Tel.: +91-4565-2322 Fax: +91-4565-22088, IN |
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| Abstract: | The stability of electrochemically formed NiF2 film in 1.0 M perchloric acid containing monovalent fluorides namely, NH4F, HF, NaF, KF and LiF, is investigated using cyclic voltammetry, chronoamperometry, atomic absorption spectroscopy and scanning electron microscopy. In addition to direct dissolution of nickel and dissolution through the oxide layer, a new mode of dissolution of NiF2 film as NiF3 − and NiF4 2− through complex formation is proposed. This process is significantly influenced by the alkali metal fluorides. On a comparative basis the stability of NiF2 decreases in the order NH4F > HF > KF > LiF. Received: 29 July 1998 / Accepted: 3 November 1998 |
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| Keywords: | NiF2 layer Nickel dissolution Monovalent fluorides |
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