| 电子回流对相对论速调管稳定工作的影响 |
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| 引用本文： | 陈永东,谢鸿全,李正红,吴洋,黄华,周自刚. 电子回流对相对论速调管稳定工作的影响[J]. 强激光与粒子束, 2013, 25(7): 1770-1774. DOI: 10.3788/HPLPB20132507.1770 |
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| 作者姓名： | 陈永东 谢鸿全 李正红 吴洋 黄华 周自刚 |
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| 作者单位： | 1.四川理工学院 理学院, 四川 自贡643000; |
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| 摘 要： | 模拟研究了电子束电压、电流及注入微波功率等参数对相对论速调管放大器中电子回流产生的影响，模拟发现注入微波过高、电子束电压过低及电子束电流过大都会导致电子回流。同时研究了回流电子对相对论速调管稳定工作的影响，研究发现，电子的回流会引起自激振荡，进而导致锁频锁相失败，器件不能稳定工作。
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| 关 键 词： | 高功率微波 相对论速调管放大器 电子回流 自激振荡 |
| 收稿时间： | 2012-11-01; |
Effect of returning electrons on stability of relativistic klystron amplifier |
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| ChenYongdong,Xie Hongquan,Li Zhenghong,Wu Yang,Huang Hua,Zhou Zigang. Effect of returning electrons on stability of relativistic klystron amplifier[J]. High Power Laser and Particle Beams, 2013, 25(7): 1770-1774. DOI: 10.3788/HPLPB20132507.1770 |
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| Authors: | ChenYongdong Xie Hongquan Li Zhenghong Wu Yang Huang Hua Zhou Zigang |
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| Affiliation: | 1.School of Science,Sichuan University of Science and Engineering,Zigong 643000,China;2.Science and Technology on High Power Microwave Laboratory,Institute of Applied Electronics,CAEP,Mianyang 621900,China;3.School of Science,Southwest University of Science and Technology,Mianyang 621010,China |
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| Abstract: | Several factors causing electrons to return, e. g. the voltage and current of electron beam, the injected power of microwave are studied in relativistic klystron amplifier (RKA). In PIC simulation, we find that high injected power, high beam current and low beam voltage all can cause the return of electrons. Moreover the effect of returning electrons on the stability of RKA is studied, which shows that returning electrons will lead to self-excited oscillation of RKA and to the fail of locking of phase and frequency, and thus the device can not work stably. |
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| Keywords: | relativistic klystron amplifier returning electron self-excited oscillation |
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