| 18.2nm Schwarzschild显微成像系统初步研究 |
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| 引用本文： | 王占山,曹健林,陈波,马月英,陈斌,张俊平,王兆岗,高宏刚,吕俊霞,陈星旦. 18.2nm Schwarzschild显微成像系统初步研究[J]. 光学学报, 1996, 16(4): 531-536 |
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| 作者姓名： | 王占山 曹健林 陈波 马月英 陈斌 张俊平 王兆岗 高宏刚 吕俊霞 陈星旦 |
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| 作者单位： | 中国科学院长春光学精密机械研究所应用光学国家重点实验室!长春130022，中国科学院长春光学精密机械研究所应用光学国家重点实验室!长春130022，中国科学院长春光学精密机械研究所应用光学国家重点实验室!长春130022，中国科学院长春光学精密机械研究所应用光学国家重点实验室!长 |
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| 摘 要： | 叙述了Schwarzschild型正入射软X射线多层膜显微成像系统的设计、制作和成像实验，其工作波长为18．2nm，放大倍数为10．5×，极限分辨率小于0．2μm。采用Mo／Si多层膜，周期和层数分别为9．5nm和41。用激光等离子体光源对20pl／mm和55pl／mm的栅网进行了软X射线显微成像实验，所得结果表明此显微成像系统的分辨率在微米量级。
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| 关 键 词： | 软X射线 多层膜 显微成像系统 |
| 收稿时间： | 1995-03-26 |
Preliminary Investigation of a Schwarzschild Microscopical System at 18. 2 nm |
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| Wang Zhanshan, Cao Jinlin, Chen Bo, Ma Yueying, Chen Bin Zhang Junping, Wang Zhaolan, Gang Honggang Lu Junxia, Chen Xiangdan. Preliminary Investigation of a Schwarzschild Microscopical System at 18. 2 nm[J]. Acta Optica Sinica, 1996, 16(4): 531-536 |
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| Authors: | Wang Zhanshan Cao Jinlin Chen Bo Ma Yueying Chen Bin Zhang Junping Wang Zhaolan Gang Honggang Lu Junxia Chen Xiangdan |
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| Abstract: | The design, construction and imaging experiments of a soft X-ray normalincidence multilayer imaging Schwarzschild microscopical system with 10. 5 ×magnification at 18. 2 nm are presented. The resolution limited by abberration and diffractions less than 0. 2 μm. Multilayer Mo/Si coatings were deposited simultaneously onto both mirrors of Schwarzschild objective. The period of multilayer and number of layers are 9. 5 nm and 41, respectively. The images of 20 pl/mm and 55 pl/mm mesh were taken with laser produced with this imaging microscopic system. |
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| Keywords: | sof X-ray multilayer micrascopical system |
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