自支撑CsI/PC膜及其X射线光电转换性能研究

为了获得大面积自支撑的高效率X射线光电转换材料,通过化学气相沉积和热蒸发镀膜工艺,制备出了大面积自支撑的CsI/PC膜,其中PC(聚碳酸酯)膜厚度为300nm,CsI膜厚度在100nm到1μm。通过扫描电镜、X射线衍射仪研究了镀膜速度和受潮对样品表面形貌结构的影响。利用MANSON光源的X射线对不同沉积速率和受潮程度的样品的X射线转换效率进行了研究。在北京同步辐射装置标定了样品X射线光电转换效率,其响应灵敏度峰值大于3000μA/W;将样品作为X射线光电阴极应用在X射线条纹相机上,在神光Ⅲ主机平台上获得了清晰的X射线图像。

Self-supported CsI/PC membrane and its photoelectric conversion property

A self-supported PC membrane was prepared through chemical vapor deposition process, and CsI was evaporated onto PC surface. Then a large-area self-supported CsI/PC membrane was prepared. The thickness of PC membrane was 300 nm, and that of CsI membrane was controlled between 100 nm to 1 m. The effects of deposition speed and deliquescence on morphology and structure were analyzed by SEM and XRD. The photoelectric conversion property was analyzed by Manson X-ray source. The energy spectral response peak value of CsI/PC membrane was above 3000 A/W which was calibrated at Beijing synchrotron radiation facility. The membrane was applied to X-ray streak camera on SG Ⅲ facility and distinct X-ray images were captured.