| 宽带折反射式紫外光刻物镜的设计 |
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| 引用本文： | 张雨东 邹海兴. 宽带折反射式紫外光刻物镜的设计[J]. 光学学报, 1992, 12(4): 58-364 |
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| 作者姓名： | 张雨东 邹海兴 |
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| 作者单位： | 中国科学院上海光学精密机械研究所 上海201800(张雨东，邹海兴)，中国科学院上海光学精密机械研究所 上海201800(王之江) |
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| 摘 要： | 本文设计了一种新系列的紫外或远紫外激光光刻物镜,它与国内外已有的紫外物镜相比,在365nm以下的光谱区,具有更宽的光谱工作带宽和较高的数值孔径.以宽带准分子激光或短弧汞氙灯做光源,无需另加色散补偿光学元件,可以进行同轴对准.
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| 关 键 词： | 紫外光刻物镜 工作宽带 数值孔径 |
| 收稿时间： | 1991-03-21 |
Broadband catadioptric UV lithography lenses design |
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| ZHANG YUDONG,Zou HATXING,WAXH ZHIJIANG. Broadband catadioptric UV lithography lenses design[J]. Acta Optica Sinica, 1992, 12(4): 58-364 |
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| Authors: | ZHANG YUDONG Zou HATXING WAXH ZHIJIANG |
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| Abstract: | The design of a series of UV or DUV lithography lenses is described in this paper. Below 365nm region, the bandwidth of these lenses is wider than that of abroad UV lithgraphy lenses, and these lenses have higher NA also. The free-running (unnar-rowed) excimer laser or meroury-xenon short are lamp can be used as illumination-source, even the through-lens alignment system can be used in these lithography lenses. |
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| Keywords: | lithography. DUV lithography exoimer laser lithography submioron lithography. |
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