| 电子束和X射线双曝光制作大高宽比高分辨率的X射线波带片 |
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| 引用本文： | 康士秀.电子束和X射线双曝光制作大高宽比高分辨率的X射线波带片[J].光学技术,2000,26(6):524-525. |
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| 作者姓名： | 康士秀 |
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| 作者单位： | 中国科学技术大学,天文与应用物理系,安徽,合肥,230026 |
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| 摘 要： | 介绍了利用电子束和 X射线束双曝光技术制作大高宽比高分辨率的 X射线聚焦或色散元件的新方法 (波长范围为 1～ 5 nm )。所制做的厚度为 10μm的 Au波带片具有 30个波带 ,最外环的宽度为 0 .5μm。实验表明 :对 8ke V的X射线来说 ,波带片的衬度大于 10 ,分辨率为 0 .5 5μm,焦距为 2 1.3cm。
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| 关 键 词： | 波带片 电子束刻蚀 X射线光刻 |
| 修稿时间： | 2000-05-15 |
High aspect ratio and resolution X-ray zoneplate fabrication using both electron beam and X-ray beam exposure technology |
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| KANG Shi-xiu.High aspect ratio and resolution X-ray zoneplate fabrication using both electron beam and X-ray beam exposure technology[J].Optical Technique,2000,26(6):524-525. |
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| Authors: | KANG Shi-xiu |
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| Abstract: | A new method of high aspect ratio and resolution zoneplate fabrication using both electron beam lithography and X ray lithography technology is described The zoneplate, composed of 10μm thick Au with 30 zones and outest zone width of 0 5μm, can be used as a focusing and chromatic dispersion device for 0 1～1nm harder X rays Results show that the zoneplate has contrast of 10 and above, resolution of 0 55μm, and focus length of 21 3cm for 8keV X ray |
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| Keywords: | zoneplate electron beam lithography X ray lithography |
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