NiPd合金在升温过程中择尤溅射的研究

用卢瑟福背散射技术,测定了NiPd(48.2wt%Pd)合金在不同温度时的溅射原子角分布,从而确定了Ni和Pd原子的部分产额随样品温度的变化关系。结果发现:Ni和Pd的部分溅射产额在居里温度附近均有较大变化,而且Pd的产额变化幅度比Ni的变化幅度大;Ni是择尤溅射元素,但是在磁相转变过程中,其择尤溅射程度却随样品温度的升高而减小。经讨论后指出,上述现象可能是由于在磁相转变过程中原子表面结合能减小和离子轰击引起的表面偏析共同引起的。 关键词：

PREFERENTIAL SPUTTERING FROM Ni-Pd ALLOY AT ELEVATED TEMPERATURES

Individual sputtering angular distributions and partial sputtering yields of Ni and Pd from Ni-Pd alloy have been measured at different temperatures, by using the Rutherford back-scattering spectrometry (RBS). The experimental results indicate that the partial sputtering yields of both Ni and Pd have a great change near the Curie temperature (the temperature of magnetic phase-transition of Ni-Pd alloy). Furthermore, the change of Pd partial sputtering: yield is greater than that of Ni. Ni is the preferentially sputtering element, but its preferential sputtering extent decreases during the magnetic phase-transition as taget temperature increases. The phenomena seem to be caused by the reduction of surface binding energies during the magnetic phase-transition, the surface segregation and the enhanced diffusion induced by-ion bombardment.