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硅表面上构筑具有化学特性的图形的新方法
引用本文:吴瑞阁,欧阳贱华,赵新生,黄小华,黄惠忠,吴念祖. 硅表面上构筑具有化学特性的图形的新方法[J]. 物理化学学报, 2001, 17(10): 931-935. DOI: 10.3866/PKU.WHXB20011013
作者姓名:吴瑞阁  欧阳贱华  赵新生  黄小华  黄惠忠  吴念祖
作者单位:State Key Laboratory of Molecular Dynamic and Stable Structures, Institute of Physical Chemistry, Peking University, Beijing 100871
基金项目:国家自然科学基金(29953001,29973003)(G1999075305)和基金项目:
摘    要:为了在硅基底上得到不同化学基团修饰的图形,在氢终止硅(111)表面运用光刻技术和光化学反应结合来控制表面成膜反应的位置,并用AFM、XPS、接触角测定等验证了这种方法的可行性.

关 键 词:单层膜  分子构筑  光刻  图形  硅表面  
收稿时间:2001-02-19
修稿时间:2001-02-19

A New Method to Pattern Silicon Surface with Chemical Functional Groups
Wu Rui-Ge,Ouyang Jian-Hua,Zhao Xin-Sheng,Huang Xiao-Hua,Huang Hui-Zhong,Wu Nian-Zu. A New Method to Pattern Silicon Surface with Chemical Functional Groups[J]. Acta Physico-Chimica Sinica, 2001, 17(10): 931-935. DOI: 10.3866/PKU.WHXB20011013
Authors:Wu Rui-Ge  Ouyang Jian-Hua  Zhao Xin-Sheng  Huang Xiao-Hua  Huang Hui-Zhong  Wu Nian-Zu
Affiliation:State Key Laboratory of Molecular Dynamic and Stable Structures, Institute of Physical Chemistry, Peking University, Beijing 100871
Abstract:Hydrogen-terminated silicon surface was found to react with 1 -alkenes to produce stable monolayers. To pattern such monolayers and create surfaces with regions of different chemical functionalities, we used the combination of the photolithography and the light induced alkylation. The surfaces had been characterized by XPS, AFM, and contact angel measurement. It is shown that this procedure can be used to prepare mi-cro-patterns of chemical functional groups on silicon substrate.
Keywords:Monolayers  Molecular architecture  Photolithograph  Pattern  Silicon surface
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