Thermodynamics of diamond film deposition at low pressure from chlorinated precursors |
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| Authors: | Z-J Liu DW Zhang Y-Z Wan J-Y Zhang J-T Wang |
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| Institution: | (1) CVD Lab., Department of Electronic Engineering, Fudan University, Shanghai 200433, P.R. China, CN |
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| Abstract: | 3 and C2H2 concentrations at growth surface and accelerating abstraction of surface-terminating atoms. The effects of Cl addition on
diamond film quality are also discussed.
Received: 1 May 1998 / Accepted: 15 October 1998 |
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| Keywords: | PACS: 81 30 Dz 81 10 -h 82 40 Py |
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