Graphene resistive random memory — the promising memory device in next generation |
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引用本文: | 王雪峰,赵海明,杨轶,任天令. Graphene resistive random memory — the promising memory device in next generation[J]. 中国物理 B, 2017, 26(3): 38501-038501. DOI: 10.1088/1674-1056/26/3/038501 |
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作者姓名: | 王雪峰 赵海明 杨轶 任天令 |
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作者单位: | 1.Institute of Microelectronics, Tsinghua University, Beijing 100084, China;2.Tsinghua National Laboratory for Information Science and Technology(TNList), Tsinghua University, Beijing 100084, China |
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摘 要: |
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收稿时间: | 2016-08-30 |
Graphene resistive random memory–the promising memory device in next generation |
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Affiliation: | 1.Institute of Microelectronics, Tsinghua University, Beijing 100084, China;2.Tsinghua National Laboratory for Information Science and Technology(TNList), Tsinghua University, Beijing 100084, China |
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Abstract: | Graphene-based resistive random access memory(GRRAM) has grasped researchers' attention due to its merits compared with ordinary RRAM. In this paper, we briefly review different types of GRRAMs. These GRRAMs can be divided into two categories: graphene RRAM and graphene oxide(GO)/reduced graphene oxide(r GO) RRAM. Using graphene as the electrode, GRRAM can own many good characteristics, such as low power consumption, higher density, transparency,SET voltage modulation, high uniformity, and so on. Graphene flakes sandwiched between two dielectric layers can lower the SET voltage and achieve multilevel switching. Moreover, the GRRAM with r GO and GO as the dielectric or electrode can be simply fabricated. Flexible and high performance RRAM and GO film can be modified by adding other materials layer or making a composite with polymer, nanoparticle, and 2D materials to further improve the performance. Above all,GRRAM shows huge potential to become the next generation memory. |
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Keywords: | graphene-based resistive random access memory graphene oxide (GO)/reduced graphene oxide (rGO) resistive switching graphene |
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