疏水增透SiO2膜的制备及其性能研究

以正硅酸乙酯(TEOS)和二甲基二乙氧基硅烷(DDS)为前驱体，在碱催化体系中通过选择合适的原料配比以及对体系溶胶 凝胶过程的控制使DDS和TEOS的水解产物发生共缩聚反应，进而制备出改性的SiO2溶胶，并采用旋转镀膜法(spin coating)直接获得了同时具有良好疏水和增透性能的SiO2光学膜，克服了增透膜防潮性能差的缺点.同时采用透射电子显微镜（TEM）、粒度分布（SDP）等手段研究了不同条件下溶胶的性质及其对膜层性能的影响，并与未经改性的SiO2增透膜进行了比较，结果表明改性后的膜层不仅疏水性大大增加，且在相同镀膜条件下，膜层的厚度随着老化时间的延长增加较小，故其透过率曲线在300～800 nm范围内不易出现多个增透峰.

Synthesis and Properties of Hydrophobic ＆ Antireflective Silica Coating

Organic methyl modified silica sols were obtained by Hydrolysis and co condensation reactions occurred in base catalyzed system by carefully controlling the sol gel process of DDS and TEOS. Both hydrophobic and antireflective silica coating was then prepared by spin coating technique from the modified sols. As a result, the moisture resistant ability of antireflective coating was highly improved. The properties of somodified sols and their effects on the coating were studied using transmission electron micrograph(TEM) and size distribution of particles(SDP) measurements. In addition, comparison was carried out between organically modified and pure silica coating and the results showed that not only the hydrophobicity of the coating was greatly improved by the modification but also the transmittance curve not easily showed multi peaks in the wavelength range of 300～800 nm.