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Effect of resonance charge exchange between argon ions on the effective sputtering rate in a magnetron discharge
Authors:I. Yu. Burmakinskii  A. V. Rogov
Affiliation:(1) Russian Research Centre Kurchatov Institute, pl. Kurchatova 1, Moscow, 123182, Russia
Abstract:The sputtering rates of various materials in a magnetron ion sputterer are compared. The effective sputtering yields obtained when argon is used as a working gas are given. The difference between the sputtering yields found in this work and those obtained with monoenergetic ion beams is shown to be associated with resonance charge exchange between argon ions and neutral argon gas.
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