Diffraction efficiency of continuously etched gratings in As2S3 films

The diffraction efficiency of gratings in chalcogenide glass thin films during the chemical etching process is described. The experiment is performed by a simultaneous etching and detection technique, and two absolute maxima with intermittent interference maxima and minima are observed. Theoretical analysis including interference effect is presented, and excellent agreement with experimental curve is obtained. Application of this technique to lithographic process for etching control is briefly discussed.