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Structured electrodeposition in magnetic gradient fields |
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| Authors: | Margitta Uhlemann Kristina Tschulik Annett Gebert Gerd Mutschke Jochen Fröhlich Andreas Bund Xuegeng Yang Kerstin Eckert |
| Affiliation: | 11878. IFW Dresden, PO Box 270016, 01171, Dresden, Germany 31878. Dept. of Chemistry, Oxford University, Oxford, OX1 3QZ, UK 21878. Inst. Fluid Dynamics, Technische Universit?t Dresden, 01062, Dresden, Germany 41878. Inst. Fluid Dynamics, Helmholtz-Zentrum Dresden-Rossendorf, 01314, Dresden, Germany 51878. Inst. Electrochem. Electroplating, Ilmenau University of Technology, 98693, Ilmenau, Germany |
| Abstract: | Electrodeposition in superimposed magnetic gradient fields is a new and promising method of structuring metal deposits while avoiding masking techniques. The magnetic properties of the ions involved, their concentrations, the electrochemical deposition parameters, and the amplitude of the applied magnetic gradient field determine the structure generated. This structure can be thicker in regions of high magnetic field gradients. It can also be free-standing or inversely structured. The complex mechanism of structured electrodeposition of metallic layers in superimposed magnetic gradient fields was studied by different experimental methods, by analytical methods and by numerical simulation and will be discussed comprehensively. |
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