A Spectro-Microscopic Approach for Thin Film Analysis: Grain Boundaries in mc-Si and Sn/SnO2 Nano Particles |
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| Authors: | Patrick Hoffmann Ricardo P. Mikalo Alexandros Yfantis David R. Batchelor Guenter Appel Dimitrios Yfantis Dieter Schmeißer |
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| Affiliation: | (1) Applied Physics – Sensors, Technical University of Cottbus, P.O. 101344, D-03044 Cottbus, Germany, DE;(2) Department of Chemical Engineering, National Technical University of Athens, Iroon Polytechniou 9, Zografou Campus, Athens, Greece, GR |
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| Abstract: | Synchrotron radiation based spectro-microscopy is shown to be an exciting tool for elemental analysis in the field of heterogeneous interfaces, thin films, and device technology. Results are reported, taken with a spectrometer that enables the combination of a photoemission electron microscope (PEEM) with photoelectron spectroscopies (XPS, UPS) operated at a high brilliance undulator beam line at BESSY. The properties of mc-Si (multi crystalline silicon) are of interest because of their applications in low priced photovoltaic devices. An example of how to analyze the surface potentials of such surfaces without removing the native oxide is given. Tin nano-scale particles are shown to be the decisive factor affecting the corrosion prevention of passivated tinplate surfaces. |
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| Keywords: | : XPS/UPS/PEEM spectro-microscopy thin film analysis tinplate mc-Si. |
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