Effective suppression of internal stresses in Co-Cr films using a mixture of Ar and Kr as the sputtering gas
Authors:
Shigeki Nakagawa and Masahiko Naoe
Affiliation:
Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152, Japan
Abstract:
A lower sputtering gas pressure during the sputtering process tends to result in the deposition of denser Co-Cr films, but also increases compressive internal stresses when a mixture of Ar and Kr is used as the sputtering gas. The internal stresses have been reduced with an increase in the ratio of Kr in the gas mixture.