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Effective suppression of internal stresses in Co-Cr films using a mixture of Ar and Kr as the sputtering gas |
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| Authors: | Shigeki Nakagawa and Masahiko Naoe |
| Institution: | Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152, Japan |
| Abstract: | A lower sputtering gas pressure during the sputtering process tends to result in the deposition of denser Co-Cr films, but also increases compressive internal stresses when a mixture of Ar and Kr is used as the sputtering gas. The internal stresses have been reduced with an increase in the ratio of Kr in the gas mixture. |
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