Preparation and self-assembly of copper nanoparticles via discharge of copper rod electrodes in a surfactant solution: a combination of physical and chemical processes |
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Authors: | Su-Yuan Xie Zhi-Jie Ma Chun-Fang Wang Shui-Chao Lin Zhi-Yuan Jiang Rong-Bin Huang Lan-Sun Zheng |
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Institution: | State Key Laboratory for Physical Chemistry of Solid Surfaces, Department of Chemistry, Xiamen University, Xiamen, 361005, China |
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Abstract: | Cu nanoparticles with a mean diameter of 10-15 nm were prepared and self-assembled via discharge of bulk copper rods in a cetyltrimethylammonium bromide (CTAB)/ascorbic acid solution. Ascorbic acid was used as a protective agent to prevent the nascent Cu nanoparticles from oxidation in the solution; otherwise spindle-like Cu2O/CuO structures, with a lateral dimension of 30-50 nm and length of up to 100 nm, were formed in pure deionized water. The surfactant CTAB had a critical influence on self-assembly of spherical Cu nanostructures (with diameter of 700 nm-1 μm). Such a low-temperature and non-vacuum method, exhibiting the characters of both physical and chemical processes, provides a versatile choice for economical preparation and assembly of various metal nanostructures. |
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Keywords: | Nanoparticle Discharge Preparation Self-assembly Copper Surfactant Colloid |
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