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Preparation and self-assembly of copper nanoparticles via discharge of copper rod electrodes in a surfactant solution: a combination of physical and chemical processes
Authors:Su-Yuan Xie  Zhi-Jie Ma  Chun-Fang Wang  Shui-Chao Lin  Zhi-Yuan Jiang  Rong-Bin Huang  Lan-Sun Zheng
Institution:State Key Laboratory for Physical Chemistry of Solid Surfaces, Department of Chemistry, Xiamen University, Xiamen, 361005, China
Abstract:Cu nanoparticles with a mean diameter of 10-15 nm were prepared and self-assembled via discharge of bulk copper rods in a cetyltrimethylammonium bromide (CTAB)/ascorbic acid solution. Ascorbic acid was used as a protective agent to prevent the nascent Cu nanoparticles from oxidation in the solution; otherwise spindle-like Cu2O/CuO structures, with a lateral dimension of 30-50 nm and length of up to 100 nm, were formed in pure deionized water. The surfactant CTAB had a critical influence on self-assembly of spherical Cu nanostructures (with diameter of 700 nm-1 μm). Such a low-temperature and non-vacuum method, exhibiting the characters of both physical and chemical processes, provides a versatile choice for economical preparation and assembly of various metal nanostructures.
Keywords:Nanoparticle  Discharge  Preparation  Self-assembly  Copper  Surfactant  Colloid
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