Prospects of developing multibeam systems for low-voltage electron lithography

The prospects of developing tiny multibeam systems for electron lithography have been considered. Designs of tiny basic elements of electron-optical systems, including a magnetic lens with an open magnetic circuit and a lens with aligned axially symmetric fields (whose magnetic circuit simultaneously plays the role of electrodes of an electrostatic lens), are represented, as well as their analysis. The results of the investigation of high-speed one-turn deflection systems without or with a core and the analysis of a stigmator are reported. Radically new approaches to design of tiny electron-optical systems have been considered, which make it possible to increase the efficiency of electron beam formation and pass to micro-and nanotechnological design of vacuum microsystems.