双极性脉冲磁控溅射电源设计

双极性脉冲电源是磁控溅射系统中的关键设备之一。根据铌溅射处理装置的技术要求，研制了一套输出电压0~800 V可调、脉冲宽度20~200 μs可调、频率0~60 Hz可调、脉冲电流最大幅值约150 A的双极性脉冲电源，分别给出了该电源在水电阻负载和等离子体负载下的实验结果。设计上采用DSP控制开关电源的方式对储能电容器进行恒流充电；综合应用FPGA，PLC及触摸屏组成人机交互系统，控制输出光脉冲信号，经负压偏置驱动后使桥式结构的脉冲形成网络产生正负交替双极性脉冲。通过大量实验论证，该电源解决了等离子体负载放电打弧等问题，达到了理想的溅射效果，满足了指标要求。

Design of bipolar pulsed magnetron sputtering power supply

Bipolar pulsed power supply is one of the key equipment in magnetron sputtering system. Based on the working principle and technical characteristics of magnetron sputtering, a bipolar pulsed power supply with output voltage of 0-800 V, pulse width of 20-200 μs, frequency of 0-60 Hz, maximum pulse current of 150 A was developed, and the experimental results for the power supply with the water resistance load and the plasma load were obtained. The charging to the energy storage capacitor in the bipolar pulsed power supply was controlled by the DSP control mode. Integrating FPGA, PLC and touch screen man-machine exchange system, the bipolar pulses were got. A large number of experimental demonstration shows that the power supply solves the problems of plasma load discharge et al., and the designed bipolar pulsed power supply achieves the desired sputtering effect and fulfills the requirements of the technical index.