基于g-C3N4的Z型光催化体系研究进展

导电聚合物型光催化材料g-C₃N₄有着独特的电子结构、稳定的化学性能和显著的可见光催化活性。基于g-C₃N₄的Z型光催化体系(Z-g-C₃N₄)的催化效率高、电子-空穴复合率低而备受关注，在光催化领域展现出了巨大的应用潜力。本文阐述了Z-g-C₃N₄型光催化反应体系的作用机理，综述了Z-g-C₃N₄在光催化领域的研究进展，介绍了Z-g-C₃N₄在产氢、转化CO₂、降解有机物等光催化领域的应用，讨论了pH值、导电介质等因素对Z-g-C₃N₄光催化性能的影响。最后指出了Z-g-C₃N₄光催化体系在研究过程中面临的问题和研究方向。

Research Progress on g-C3N4-Based Z-Scheme Photocatalytic System

Graphitic carbon nitride (g-C₃N₄) is a promising photocatalyst because of its low cost, high stability, and visible-light-induced photocatalytic activity. Z-scheme photocatalysts based on g-C₃N₄ (Z-g-C₃N₄) have attracted considerable attention because of their lower recombination rate of electron-holes and higher catalytic efficiency. In this review, the reaction mechanism of Z-scheme photocatalysis and the recent progress in Z-gC₃N₄ are introduced and reviewed. The applications of Z-g-C₃N₄, such as water splitting and CO₂ reduction, are presented. The key factors that affect the photocatalytic performance, such as pH and the presence of electron mediators, are discussed. Moreover, the current challenges are described and the future development of Z-gC₃N₄ is forecast.