Molecular sputter depth profiling using carbon cluster beams |
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Authors: | Andreas Wucher Nicholas Winograd |
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Institution: | 1. Fakult?t für Physik, Universit?t Duisburg-Essen, 47048, Duisburg, Germany 2. Department of Chemistry, Pennsylvania State University, 104 Chemistry Bldg., University Park, PA, 16802, USA
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Abstract: | Sputter depth profiling of organic films while maintaining the molecular integrity of the sample has long been deemed impossible
because of the accumulation of ion bombardment-induced chemical damage. Only recently, it was found that this problem can
be greatly reduced if cluster ion beams are used for sputter erosion. For organic samples, carbon cluster ions appear to be
particularly well suited for such a task. Analysis of available data reveals that a projectile appears to be more effective
as the number of carbon atoms in the cluster is increased, leaving fullerene ions as the most promising candidates to date.
Using a commercially available, highly focused C60q+ cluster ion beam, we demonstrate the versatility of the technique for depth profiling various organic films deposited on
a silicon substrate and elucidate the dependence of the results on properties such as projectile ion impact energy and angle,
and sample temperature. Moreover, examples are shown where the technique is applied to organic multilayer structures in order
to investigate the depth resolution across film-film interfaces. These model experiments allow collection of valuable information
on how cluster impact molecular depth profiling works and how to understand and optimize the depth resolution achieved using
this technique. |
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