金刚石薄膜的红外椭圆偏振光谱研究

采用红外椭圆偏振光谱对微波等离子体化学气相沉积法（MPCVD）和热丝化学气相沉积法（H-FCVD）制备的金刚石薄膜在红外波长范围（2.5—12.5μm）的光学参数进行了测量.建立了不同的光学模型，且在模型中采用Bruggeman有效介质近似方法综合考虑了薄膜表面和界面的椭偏效应.结果表明，MPCVD金刚石膜的椭偏数据在模型引入了厚度为77.5nm的硅表面氧化层、HFCVD金刚石膜引入879nm粗糙层之后能得到很好的拟合.最后对两种模型下金刚石薄膜的折射率和消光系数进行了计算，表明MPCVD金刚石薄膜的红外关键词：金刚石薄膜红外椭圆偏振光谱光学参数有效介质近似

Study on optical properties of diamond films by means of infrared spectroscopic ellipsometry

We have made spectroscopic ellipsometric measurement to characterize the structure of diamond films in infrared region (2.5—12.5μm). These films are grown respectively by microwave plasma chemical vapor deposition (MPCVD) and hot filament chemical vapor deposition (HFCVD). It is found that the establishment of appropriate models has the strongest influence on the fit of ellipsometric spectra. The best fit is achieved for MPCVD film with a 77.5nm middle layer of SiO₂, and for HFCVD film with a 879nm rough surface layer included by Bruggeman effective medium approximation. Finally, the refractive index (n) and the extinctive coefficient (k) are calculated for both films, which show that the film grown by MPCVD is optically better than by HFCVD apparently.