Synthesis of new vinyl ether functionalized silica for UV-patterning

We report a new ORganically MOdified SILicates (ORMOSILs) stable sol based on vinyl ether function which can be deposited as a layer and structured by mean of UV radiation through a mask or by direct laser writing. Silica matrix is synthesized by sol–gel process and organic network is formed by photopolymerization. One of the potential applications is the fabrication of integrated optical circuits. [2-(3,4 epoxycyclohexyl ethyltrimethoxysilane)] has already used for the fabrication of such devices and to develop microstructures on an organic substrate by cationic polymerization. Obtained results show some weakness such as an important contribution of OH and aliphatic CH groups to the attenuation at 1550 nm wavelength and low conversion rate of organic polymerization involving poor mechanical properties. This work treats on the design of a new generation of hybrid materials with a very high reactivity and low amount of groups involved in the attenuation. We have chosen vinyl ether function as reactive organic part for her highest polymerization rate via cationic way. The new synthesized molecule is 4-vinylether phenyltriethoxysilane. Sol–gel kinetic reactions were monitored by liquid ²⁹Si-NMR spectroscopy. In order to obtain the highest reactive multifunctional oligomers and the lowest OH groups, hydrolysis and polycondensation reactions were followed as a function of time, temperature and pH of the water involved in the hydrolysis conditions. Finally, we show the feasibility to microstructure films deposited with this sol.