| 溅射腔气压对电极材料析氢活性的影响 |
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| 引用本文： | 宋红,张庆宝,魏长春,耿新华. 溅射腔气压对电极材料析氢活性的影响[J]. 人工晶体学报, 2006, 35(6): 1291-1295 |
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| 作者姓名： | 宋红 张庆宝 魏长春 耿新华 |
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| 作者单位： | 南开大学 |
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| 摘 要： | 采用直流磁控溅射法制备了析氢反应的电极材料-NiFe,CoMo,研究了在1.0Pa～4.0Pa的范围内,不同溅射腔气压条件下制备的电极材料的晶粒尺寸、析氢反应的过电位与气压的关系,结果显示过电位随气压升高而降低,而且在2.0Pa处,过电位变化的程度和Tafel斜率均发生突变,表明不同溅射气压下制备的材料晶粒尺寸的变化,引起了析氢反应控制步骤的改变.
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| 关 键 词： | 析氢电极材料 气压 过电位 晶粒尺寸 |
| 文章编号： | 1000-985X（2006）06-1291-05 |
| 收稿时间： | 2006-06-28 |
| 修稿时间： | 2006-06-282006-08-19 |
Influnce of Sputtering Pressure on Hydrogen Evolution Reaction of Catalysis Electrode Films |
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| SONG Hong,ZHANG Qin-bao,WEI Chang-chun,GENG Xin-hua. Influnce of Sputtering Pressure on Hydrogen Evolution Reaction of Catalysis Electrode Films[J]. Journal of Synthetic Crystals, 2006, 35(6): 1291-1295 |
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| Authors: | SONG Hong ZHANG Qin-bao WEI Chang-chun GENG Xin-hua |
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| Affiliation: | Institute of Photo-electronics Thin Film Devices and Technique of Navkai University, Tianjin 300071, China; Key Laboratory of Photo-electronics Thin Film Devices and Technique of Tianjin, Tianjin 300071, China; Key Laboratory of Opto-electronic Information Science and Technology ( Nankai University,Tianjin University |
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| Abstract: | Using DC magnetron sputtering device to prepare hydrogen evolution reaction(HER) electrodes,at the rang of 1.0-4.0Pa,catalysis electrode films of NiFe,CoMo of HER prepared at different sputtering pressure,their crystal size and HER overpotential decreased with increasing of chamber pressure,and their overpotential and Tafel slope were changed sharply at 2.0Pa.These showed that crystal size is crucial factor to the step of HER,and Tafel slope changed with it. |
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| Keywords: | catalysis electrode films sputtering pressure overpotential crystal size |
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