| Abstract: | A universal X-ray diffractometer is used for the structural complex investigation of GaAs1−xPx epitaxial layers, grown on the (100) face of GaAs substrate. Information is obtained from the analyses of diffraction patterns for some qualities of the epitaxial layers: crystallographical orientation, composition, thickness, as well as structure of the transition region. The suggested complex method has important advantages against the standard Laue method. It is far easier express and convenient for serial investigations. |
