中间层Re的加入对覆膜钡钨阴极性能的改善

研究了一种新型的覆膜钡钨阴极——双层膜(Os-W/Re膜)钡钨阴极.对这种新型阴极的发射性能进行了测试，重点对其老炼前后表面薄膜的微观形貌进行了分析，表明中间层Re膜的加入使覆膜钡钨阴极的性能得到了改善.通过对Os-W双元合金膜钡钨阴极和Os-W/Re双层膜钡钨阴极发射特性的比较，发现Os-W/Re双层膜阴极的直流发射性能好于Os-W合金膜阴极.对两种阴极激活后发射表面的X射线光电子能谱分析表明，Os-W/Re双层膜阴极激活后表面形成的三元合金膜是其发射特性优于Os-W合金膜阴极的主要原因.应用扫描电子显微镜分析比较两种阴极激活老炼后的表面状态，结果表明：Os-W合金膜阴极在老炼一段时间后，其表面薄膜出现开裂，这会导致阴极发射均匀性下降；而Os-W/Re双层膜阴极在同样老炼条件下，发射表面薄膜均匀并保持完整，从而确保覆膜钡钨阴极发射均匀性和工作可靠性.关键词：双层膜钡钨阴极Os-W/Re膜Os-W膜薄膜开裂

Improved performance of the dispenser cathode with a Re intermediate layer

A new type dispenser cathode with Os-W/Re dual-layer has been developed. Emission performance and surface microstructure of the cathode with the dual-layer before and after ageing were studied. The performance of the dispenser cathode is improved by introducing a Re intermediate leyer. DC current density of the dispenser cathodes coated with Os-W alloy and Os-W/Re were compared. It is found that the cathode with Os-W/Re shows better emission performance than the cathode with Os-W alloy. Both cathodes were investigated using X-ray photoelectron spectroscopy after full activation. Ternary alloy coating being formed for the cathode with Os-W/Re is the major reason for its better emission performance. Scanning electron microscopy was used for investigating surface microstructures of both kinds of cathodes and the results show that the emitting surface of the cathode with Os-W alloy after ageing appeared non-adherent (flaking) in localized areas. This is one of the reasons for its non-uniform emission. However, surface of the cathode with Os-W/Re does not suffer from peeling under the same conditions, thus ensuring better emission uniformity and functional reliability of the dispenser cathode.