首页 | 本学科首页   官方微博 | 高级检索  
     检索      

Si,GaAs和LiNbO3单晶的堵塞效应
引用本文:陈昌,魏成连,董玉兰,刘世杰,夏广昌,范景云,王启良,高之纬.Si,GaAs和LiNbO3单晶的堵塞效应[J].物理学报,1979,28(3):324-333.
作者姓名:陈昌  魏成连  董玉兰  刘世杰  夏广昌  范景云  王启良  高之纬
作者单位:中国科学院高能物理研究所
摘    要:我们利用背散射方法得到Si,GaAs和LiNbO3单晶堵塞图,以及GaAs单晶{110},{100}和{112}面堵塞半角ψ1/2值.并得到因离子注入受损伤Si片{110}面堵塞坑深度随注入剂量增加而变浅的结果。作为对实验装置和方法的检验,我们也得到了Si单晶堵塞图和测量了Si单晶{110},{111}和{100}晶面堵塞半角ψ1/2值。 关键词

收稿时间:1978-05-29

THE BLOCKING EFFECT OF Si, GaAs AND LiNbO3 SINGLE CRYSTALS
CHEN CHANG,WEI CHENG-LIAN,DONG YU-LAIN,LIU SHI-JIE,XIA GUANG-CHANG,FAN JING-YUN,WANG QI-LIANG and GAO ZHI-WEI.THE BLOCKING EFFECT OF Si, GaAs AND LiNbO3 SINGLE CRYSTALS[J].Acta Physica Sinica,1979,28(3):324-333.
Authors:CHEN CHANG  WEI CHENG-LIAN  DONG YU-LAIN  LIU SHI-JIE  XIA GUANG-CHANG  FAN JING-YUN  WANG QI-LIANG and GAO ZHI-WEI
Abstract:By making use of the back scattering method Si, GaAs and LiNbO3 Single Crystal blocking patterns were obtained and GaAs single crystal {110}, {100} and {112} plane blocking halfangle ψ1/2 values were estimated. We have found that the depth of the {110} plane blocking dip of Si slice damaged due to ion implanting becomes shallow when implantation dose increases. In order to check the experimental apparatus and the method, we have also obtained Si single crystal blocking pattern and measured the values of Si single crystal {110}, {111} and {100} crystal plane blocking halfangles
Keywords:
点击此处可从《物理学报》浏览原始摘要信息
点击此处可从《物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号