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The dynamics of the SiF4 - sensitized processes initiated by a pulsed CO2 laser
Institution:1. College of Chemistry and Pharmaceutical Sciences, Qingdao Agricultural University, Qingdao, Shandong 266109, PR China;2. School of Chemistry and Chemical Engineering, School of Materials Science and Engineering, University of Jinan, Jinan, Shandong 250022, PR China;3. Key Laboratory of Carbon Materials of Zhejiang Province, Institute of New Materials and Industrial Technologies, Wenzhou University, Wenzhou, Zhejiang 325035, PR China;1. State Key Laboratory of Environmental Criteria and Risk Assessment, Chinese Research Academy of Environmental Science, Beijing 100012, PR China;2. College of Water Sciences, Beijing Normal University, Beijing 100875, PR China;1. School of Chemistry and Chemical Engineering, Shanxi Datong University, Datong, Shanxi 037009, PR China;2. College of Chemistry, Beijing Normal University, Beijing 100875, PR China
Abstract:A model enabling the examination of the dynamics of the SiF4 - sensitized processes initiated by a pulsed CO2 laser is outlined, taking into account three effects : energy absorption, energeticity of chemical reactions and expansion of hot gas created upon interaction of molecules with the infrared photon field. This approach was used to elucidate some aspects regarding the decomposition of PH3 and GeH4.
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