Backscattering of low-energy (0–8 eV) electrons by a silicon surface |
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Authors: | O. B. Shpenik N. M. Érdevdi T. Yu. Popik |
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Affiliation: | (1) Institute of Electron Physics, Ukrainian Academy of Sciences, 294016 Uzhgorod, Ukraine |
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Abstract: | An experimental apparatus and method for investigating elastic and inelastic backscattering (180°) of low-energy (0–8 eV) monoenergetic electrons by a solid surface are described and the first results are presented for the reflection of electrons by samples of pure single-crystalline silicon with a polished surface (Si), doped p-type single-crystalline silicon with a porous surface (Si-p) as well as H2O and H2O2 passivated porous samples, Si-p + H2O and Si-p + H2O2. A structure due to the excitation of surface plasmons has been observed for the first time in the loss spectra. Features corresponding to a resonance excited state of molecular nitrogen adsorbed on the surface of porous silicon have been observed in the constant residual energy spectra. Zh. Tekh. Fiz. 67, 103–108 (May 1997) |
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