Backscattering of low-energy (0–8 eV) electrons by a silicon surface |
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Authors: | O B Shpenik N M Érdevdi T Yu Popik |
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Institution: | (1) Institute of Electron Physics, Ukrainian Academy of Sciences, 294016 Uzhgorod, Ukraine |
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Abstract: | An experimental apparatus and method for investigating elastic and inelastic backscattering (180°) of low-energy (0–8 eV)
monoenergetic electrons by a solid surface are described and the first results are presented for the reflection of electrons
by samples of pure single-crystalline silicon with a polished surface (Si), doped p-type single-crystalline silicon with a porous surface (Si-p) as well as H2O and H2O2 passivated porous samples, Si-p + H2O and Si-p + H2O2. A structure due to the excitation of surface plasmons has been observed for the first time in the loss spectra. Features
corresponding to a resonance excited state of molecular nitrogen adsorbed on the surface of porous silicon have been observed
in the constant residual energy spectra.
Zh. Tekh. Fiz. 67, 103–108 (May 1997) |
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