Hydrogen desorption from tantalum with segregated oxide surface layers |
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| Affiliation: | 1. School of Materials Science and Engineering, Beihang University, Beijing, 100083, China;2. Center for Integrated Computational Materials Engineering (International Research Institute for Multidisciplinary Science) and Key Laboratory of High-Temperature Structural Materials & Coatings Technology (Ministry of Industry and Information Technology), Beihang University, Beijing, 100083, China;3. IT4Innovations Center, VSB-Technical University of Ostrava, CZ-70833, Ostrava, Czech Republic;4. Hangzhou Innovation Institute, Beihang University, Hangzhou, 310052, China;5. Beijing Advanced Innovation Center for Biomedical Engineering, Beihang University, Beijing, 100083, China |
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| Abstract: | The combination of thermal desorption spectroscopy (TDS) and Auger electron spectroscopy (AES) was used to examine the correlation between elementary processes on an oxidized tantalum surface and the acceleration of the dehydriding rates at increasing temperatures. We present the TDS of TaDx foils (foil thickness ~ 25μm) for various initial concentrations (0.038 ⩽ x ⩽ 0.108; α-phase), various heating rates and for high and ultra high vacuum conditions. Activation energies for desorption were derived from the TDS spectra on the assumption that the rate determining process is the recombination of hydrogen atoms to hydrogen molecules at the surface. We find two different activation energies for the low and for the high temperature region. The AES measurements show that the corresponding change in the desorption process is correlated with the dissolution of the segregated oxide surface layer. |
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