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Efficient Deposition of Semiconductor Powders for Photoelectrocatalysis by Airbrush Spraying
Authors:Ramona Gutkowski  Dominik Schäfer  Tharamani C Nagaiah  Jorgé E Yanez Heras  Wilma Busser  Martin Muhler  Wolfgang Schuhmann
Institution:1. Analytical Chemistry – Center for Electrochemical Sciences (CES), Ruhr‐Universit?t Bochum, 44780 Bochum, Germany;2. Department of Chemistry, Indian Institute of Technology Ropar, Rupnagar, Punjab, India;3. Laboratory of Industrial Chemistry, Ruhr‐Universit?t Bochum, 44780 Bochum, Germany
Abstract:Powder catalysts were deposited as thin films on transparent conductive oxides (TCO) by means of an airbrush spray coating technique. Photoelectrocatalytic properties of the powder catalysts were characterized using photocurrent spectroscopy at different wavelengths demonstrating on the one hand the stability of the films and on the other hand the electrical connection with the electrode surface. The morphology and thickness of the deposited powder catalyst films on TCO were characterized using scanning electron microscopy. Aiming at photocatalytic water splitting, semiconductor powders like gallium oxide (Ga2O3) and zinc oxide (ZnO) were used as test samples to optimize the deposition technique resulting in thin homogeneous layers and good adhesion on the conductive substrate. The proposed airbrush deposition technique of powder catalysts allows closing an experimental gap between microheterogeneous systems and modified electrodes for finding suitable materials for photoelectrochemical water splitting.
Keywords:ZnO  Ga2O3  Photoelectrocatalysis  Airbrush  Oxygen evolution reaction  IPCE
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